SLA (Stereolithographia) est processus fabricationis additivae qui operatur per focalizationem laseris UV in dolium resinae photopolymericae. Auxilio programmatis fabricationis computatralis vel designationis computatralis adiuvatae (CAM/CAD), laser UV adhibetur ad designationem vel formam prae-programmatam in superficie doli photopolymeri delineandam. Photopolymera sensibilia sunt luci ultraviolettae, ita resina photochemice solidificatur et stratum singulum obiecti tridimensionalis desiderati format. Hic processus repetitur pro quolibet strato designationis donec obiectum tridimensionale completum est.
CARMANHAAS clientibus offerre potest systema opticum quod praecipue continet celerem Galvanometrum Scanner et lentem scansionis F-THETA, expansorem fasciculi, speculum, et cetera.
Caput Scrutatoris Galvo 355nm
Modellum | PSH14-H | PSH20-H | PSH30-H |
Caput explorationis aquae refrigeratum/obsignatum | ita | ita | ita |
Apertura (mm) | 14 | 20 | 30 |
Angulus Efficax Scrutationis | ±10° | ±10° | ±10° |
Error Sequendi | 0.19 ms | 0.28ms | 0.45ms |
Tempus Responsionis Gradus (1% scalae plenae) | ≤ 0.4 ms | ≤ 0.6 ms | ≤ 0.9 ms |
Celeritas Typica | |||
Positio / saltus | < 15 m/s | < 12 m/s | < 9 m/s |
Linearum exploratio/rasteris exploratio | < 10 m/s | < 7 m/s | < 4 m/s |
Typica exploratio vectoris | < 4 m/s | < 3 m/s | < 2 m/s |
Bona qualitas scribendi | 700 cps | 450 cps | 260 cps |
Alta scripturae qualitas | 550 cps | 320 cps | CLXXX cps |
Praecisio | |||
Linearitas | 99.9% | 99.9% | 99.9% |
Resolutio | ≤ 1 urad | ≤ 1 urad | ≤ 1 urad |
Repetibilitas | ≤ 2 urad | ≤ 2 urad | ≤ 2 urad |
Temperaturae Deviatio | |||
Drift Offset | ≤ 3 urad/℃ | ≤ 3 urad/℃ | ≤ 3 urad/℃ |
Aberratio Longi Temporis per Octo Horas (Post Admonitionem XV Minutarum) | ≤ 30 urad | ≤ 30 urad | ≤ 30 urad |
Ambitus Temperaturae Operativae | 25℃±10℃ | 25℃±10℃ | 25℃±10℃ |
Interfacies Signalis | Analogicum: ±10V Digitale: protocollum XY2-100 | Analogicum: ±10V Digitale: protocollum XY2-100 | Analogicum: ±10V Digitale: protocollum XY2-100 |
Potentia Ingressa Requisita (DC) | ±15V @ 4A Maxima RMS | ±15V @ 4A Maxima RMS | ±15V @ 4A Maxima RMS |
355nmF-Theta Lenses
Descriptio Partis | Longitudo Focalis (mm) | Campus Scrutationis (mm) | Introitus Maximus Discipula (mm) | Distantia Operativa (mm) | Montatio Filum |
SL-355-360-580 | 580 | 360x360 | 16 | DCCLX | M85x1 |
SL-355-520-750 | DCCCL | 520x520 | 10 | 824.4 | M85x1 |
SL-355-610-840-(15CA) | DCCCXL | 610x610 | 15 | 910 | M85x1 |
SL-355-800-1090-(18CA) | 1090 | 800x800 | 18 | 1193 | M85x1 |
Expansor Fasciculi 355nm
Descriptio Partis | Expansio Ratio | Input CA (mm) | Diameter Productionis (mm) | Domus Dia (mm) | Domus Longitudo (mm) | Montatio Filum |
BE3-355-D30:84.5-3x-A(M30*1-M43*0.5) | 3X | 10 | 33 | 46 | 84.5 | M30*1-M43*0.5 |
BE3-355-D33:84.5-5x-A(M30*1-M43*0.5) | 5X | 10 | 33 | 46 | 84.5 | M30*1-M43*0.5 |
BE3-355-D33:80.3-7x-A(M30*1-M43*0.5) | 7X | 10 | 33 | 46 | 80.3 | M30*1-M43*0.5 |
BE3-355-D30:90-8x-A(M30*1-M43*0.5) | 8X | 10 | 33 | 46 | 90.0 | M30*1-M43*0.5 |
BE3-355-D30:72-10x-A(M30*1-M43*0.5) | Decem | 10 | 33 | 46 | 72.0 | M30*1-M43*0.5 |
Speculum 355nm
Descriptio Partis | Diameter (mm) | Crassitudo (mm) | Tegumentum |
Speculum 355 | 30 | 3 | HR@355nm, 45° AOI |
Speculum 355 | 20 | 5 | HR@355nm, 45° AOI |
Speculum 355 | 30 | 5 | HR@355nm, 45° AOI |